Catalog Products » Protein Isolation and Purification » Protein Purification Resins » High Affinity Ni-Charged Resin FF
High Affinity Ni-Charged Resin FF

High Affinity Ni-Charged Resin FF

Figure 1. Schematic diagram of the chemical structure of Ni IDA Resin, Ni IDA Resin FF, Hi affinity Ni-Charged Resin and Hi affinity Ni-Charged Resin FF

High Affinity Ni-Charged Resin FF

GenScript High Affinity Ni-Charged Resin FF is an 6% highly cross-linked agarose medium covalently coupled to a chelating agent that binds Ni2+ by four coordination sites for high-affinity purification of polyhistidine-tagged recombinant proteins.
L00666
$64.00

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Description

GenScript High Affinity Ni-Charged Resin FF is an 6% highly cross-linked agarose medium covalently coupled to a chelating agent that binds Ni2+ by four coordination sites for high-affinity purification of polyhistidine-tagged recombinant proteins.
High Affinity Ni-Charged Resin FF has low Ni2+ leakage, high protein-binding capacity and stability, and is compatible with a wide range of additives used in protein purification. This makes High Affinity Ni Charged Resin FF the excellent choice for high performance purification of polyhistidine-tagged proteins.

Characteristics of High Affinity Ni-Charged Resin FF

Matrix spherical
6% highly cross-linked agarose
Average particle size
90 µm (45-165 µm)
Dynamic Binding capacity1
≥50 mg of histidine-tagged protein /mL settled resin
Storage solution 
20% ethanol
Storage temperaturestored at 2-8 °C; DO NOT FREEZE
1 Dynamic binding capacity conditions:
Sample: 5 mg/mL (histidine)6-tagged pure proteins (Mr 43 000) in binding buffer (capacity at 10%  Breakthrough)
Column volume: 1 mL 
Retention time: 3min
Flow rate: 0.333 mL/min
Binding buffer: 20 mM sodium phosphate, 500 mM NaCl, 10 mM imidazole, pH 7.4
Elution buffer: 20 mM sodium phosphate, 500 mM NaCl, 250 mM imidazole, pH 7.4 
Note: Dynamic binding capacity is protein-dependent.

Reagents Compatible with High Affinity Ni-Charged Resin FF

Reducing agentsDenaturants
DetergentsSaltsOthers
1 mM DTT6 M Gua·HCl
2% Triton X-1004 M MgCl250% glycerol
20 mM β-ME       
8 M Urea  
2% Tween 205 mM CaCl220% ethanol
5mM TCEP-HCl——50% glycerin2 M NaCl1 mM EDTA
10 mM reduced glutathione————100mM Na2SO460 mM citrate
† Tested for 1 week at 40°C. 
 The strong chelator EDTA has been used successfully in some cases at 1 mM. Generally, chelating agents should be used with caution (and only in the sample, not in buffers). Any metal ion stripping may be counteracted by addition of a small excess of MgCl2 before centrifugation/filtration of the sample. Note that stripping effects may vary with applied sample volume.

Examples
  • High Affinity Ni-Charged Resin FF
  • High Affinity Ni-Charged Resin FF

  • High Affinity Ni-Charged Resin FF
  • High Affinity Ni-Charged Resin FF

    Figure 1. Schematic diagram of the chemical structure of Ni IDA Resin, Ni IDA Resin FF, Hi affinity Ni-Charged Resin and Hi affinity Ni-Charged Resin FF


For research and manufacturing use. Direct human use, including taking orally and injection are forbidden.


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